SOI wafer

4" 5" 6" 8" SOI wafer

SOI wafers apply to a wide range of products across a broad base of industries like MEMS and CMOS integrated circuit fabrication.

Commonly, SOI wafers can deliver better performance on SOI devices. 


Product Name
SOI Wafer
Unit
Diameter
100
125
150
200
mm
Substrate Specification
Growth Method
CZ / MCZ / FZ
µm
Orientation
<100> / <111> / <110>
 
Dopant
P: Boron
 
N: Arsenic / Antimony / Phosphorus/ Red Phosphorus
 
Resistivity*
0.001 ~ 20000
Ω.cm
Device Layer
Thickness*
1.5
0.1~ 300
µm
Buried Oxide Layer
Thickness*
0.02 ~ 5.0
µm
Handle Layer
Thickness*
200 ~ 1250
500 ~ 750
µm
Surface
Lapped / Etched / Polished
* Other customized specifications are welcome