Ga2O3 Gallium Oxide Wafer |
Unit |
||||
Diameter |
50.8±0.3 |
100±0.5 |
mm |
||
Orientation |
<-201> |
<001> |
degree |
||
Dopant/ Conductivity |
Sn/ N |
Undoped/ N |
Fe/Insulating |
Sn/ N |
|
Doping concentration |
5E17~9E18 cm-3 |
<5E17 cm-3 |
R>1010Ω・cm |
1E18~ 2E19 cm-3 |
|
Thickness |
650±20 |
um |
|||
Offset angle |
[010]:0±0.4 |
[010]:0±0.4 |
[010]:0 ±1 |
[010]:0±1 |
|
FWHM |
[010]:≦150 |
[010]:≦150 |
[010]:≦150 |
[010]:≦350 |
arcsec |
Surface |
SSP |
|